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Do you need to GUARANTEE 100% removal of water contamination and no added particles? Solvent vapor drying is the only process to GUARANTEE both. The vapor drying process reduces contamination as it excludes water evaporation. Solvent vapor drying allows water to be displaced, removing 100% of the water and other contaminants from the product surface without adding particulates, delivering consistent cleanliness and quality. Proven technology used in a wide range of applications including: glass substrates, lenses, silicon wafers, compound wafers, and disc media. Other benefits include capture and reclamation of the drying media in a safe, environmentally compliant system.